Gallade Chemical - Chemical Distributor
Navigate:  Store Home / Brands / FUJIFILM Electronic Materials / Photoresists / SC Resist Series
Product   Price    

SC Resist Series

Add To Cart

SC Resist Series MAIN
Untitled Document

• Negative-acting resists designed to produce coating thicknesses that range from 20,000A to 60,000A.
• High quality images with excellent edge acuity are produced that are resistant to a variety of etchants including those commonly employed to etch silicon.
• SC Resists virtually eliminate post-development scumming that is related to ambient conditions.
• Process latitude is improved and productivity Increased by minimizing poor development effects caused by process delays.
• SC Resist images have good adhesion to a variety of substrates and are resistant to nitric/hydrofluoric/ acetic acid solutions, buffered hydrofluoric acid etchants, and solutions employed to etch metal layers.
• SC Resists are compatible with In-line and convection bake ovens and can be developed with spray or immersion processes.
• SC Resists exhibit post sensitivity in the Near UV portion of the spectrum.
• They can be employed in alignment systems that contain exposure sources, such as mercury lamps, whose intensity is sufficient to produce cross linking.
• It is recommended that coated, unexposed substrates, and unopened bottles of resist be handled under gold fluorescent lamps or other light sources with suitable ultraviolet filters.

More Info - Click Here

There are currently no questions about this product.
Ask a Question

714 546 9901 x124
Returning Customer?
Shipping Policy Return Policy
Shopping Cart

The Shopping Cart is currently empty

Purchasing Guidelines Chemicals

Must be a commercial business shipping to U.S. business address
* No individuals
* No International

Include chemical use/application in order comments
Orders failing to meet these guidelines will be cancelled