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SC Resist Series

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SC Resist Series MAIN
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• Negative-acting resists designed to produce coating thicknesses that range from 20,000A to 60,000A.
• High quality images with excellent edge acuity are produced that are resistant to a variety of etchants including those commonly employed to etch silicon.
• SC Resists virtually eliminate post-development scumming that is related to ambient conditions.
• Process latitude is improved and productivity Increased by minimizing poor development effects caused by process delays.
• SC Resist images have good adhesion to a variety of substrates and are resistant to nitric/hydrofluoric/ acetic acid solutions, buffered hydrofluoric acid etchants, and solutions employed to etch metal layers.
• SC Resists are compatible with In-line and convection bake ovens and can be developed with spray or immersion processes.
• SC Resists exhibit post sensitivity in the Near UV portion of the spectrum.
• They can be employed in alignment systems that contain exposure sources, such as mercury lamps, whose intensity is sufficient to produce cross linking.
• It is recommended that coated, unexposed substrates, and unopened bottles of resist be handled under gold fluorescent lamps or other light sources with suitable ultraviolet filters.

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