<h1>SC Resist Series -- Gallade Chemical Shopping Cart</h1>
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<p>• Negative-acting resists designed to produce coating thicknesses that
range from 20,000A to 60,000A.<br>
• High quality images with excellent edge acuity are produced that are
resistant to a variety of etchants including those commonly employed to
etch silicon.<br>
• SC Resists virtually eliminate post-development scumming that is
related to ambient conditions.<br>
• Process latitude is improved and productivity Increased by minimizing
poor development effects caused by process delays.<br>
• SC Resist images have good adhesion to a variety of substrates and
are resistant to nitric/hydrofluoric/ acetic acid solutions, buffered
hydrofluoric acid etchants, and solutions employed to etch metal layers.<br>
• SC Resists are compatible with In-line and convection bake ovens and
can be developed with spray or immersion processes.<br>
• SC Resists exhibit post sensitivity in the Near UV portion of the
spectrum.<br>
• They can be employed in alignment systems that contain exposure
sources, such as mercury lamps, whose intensity is sufficient to produce
cross linking.<br>
• It is recommended that coated, unexposed substrates, and unopened
bottles of resist be handled under gold fluorescent lamps or other light
sources with suitable ultraviolet filters. </p>
<p><a href="http://www.fujifilm-ffem.com/downloads/SC%20Resist.pdf" target="_blank">More Info - Click Here</a> </p>
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<li>Brand: FUJIFILM</li>
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